Journal of Vacuum Science & Technology B, Vol.13, No.3, 848-857, 1995
Thin-Film Interferometry of Patterned Surfaces
Keywords:INSITU ELLIPSOMETRY;REAL-TIME;THICKNESS MEASUREMENT;ETCH-RATE;POSTPLASMA SURFACE;AMORPHOUS-CARBON;EPITAXIAL-GROWTH;SILICON;PLASMAS;SI