Previous Article Next Article Table of Contents Journal of Vacuum Science & Technology B, Vol.13, No.3, 833-839, 1995 DOI10.1116/1.588193 Export Citation Effect of Remaining Solvent on Sensitivity, Diffusion of Acid, and Resolution in Chemical Amplification Resists Asakawa K, Ushirogouchi T, Nakase M Please enable JavaScript to view the comments powered by Disqus.