Previous Article Next Article Table of Contents Journal of Vacuum Science & Technology B, Vol.13, No.2, 396-398, 1995 DOI10.1116/1.587954 Export Citation Gate Oxide Degradation During Polysilicon Etching in a Parallel-Plate Plasma-Type Etcher Lee DD, Kim JH, Shin KS, Park HS, Choi SH Keywords:DAMAGE;CHARGE Please enable JavaScript to view the comments powered by Disqus.
