Previous Article Next Article Table of Contents Journal of Vacuum Science & Technology B, Vol.12, No.6, 3874-3878, 1994 DOI10.1116/1.587566 Export Citation High-Speed Single-Layer-Resist Process and Energy-Dependent Aspect Ratios for 0.2-Mu-M Electron-Beam Lithography Murai F, Yamamoto J, Yamaguchi H, Okazaki S, Sato K, Hasegawa K, Hayakawa H Keywords:CELL-PROJECTION LITHOGRAPHY;SYSTEM Please enable JavaScript to view the comments powered by Disqus.
