Previous Article Next Article Table of Contents Journal of Vacuum Science & Technology B, Vol.12, No.6, 3306-3310, 1994 DOI10.1116/1.587617 Export Citation Reflectance Modeling for in-Situ Dry Etch Monitoring of Bulk SiO2 and III-V Multilayer Structures Hicks SE, Parkes W, Wilkinson JA, Wilkinson CD Keywords:OPTICAL-PROPERTIES;ELLIPSOMETRY;GAAS;HETEROSTRUCTURES;PARAMETERS;GAP;INP Please enable JavaScript to view the comments powered by Disqus.
