Biaxially textured yttria-stabilized zirconia thin films were deposited at high rates (approximate to 3 mu m/h) using a two-target reactive magnetron sputtering geometry. The two small-area magnetron targets were mounted at 45 degrees or 56 degrees with respect to, and on opposite sides of, the substrate normal. The films showed strong (001) out-of-plane texture. Azimuthal x-ray diffraction scans confirmed strong in-plane texture with a best (111)-peak full width at half maximum of 23 degrees. The alignment was presumably due to directed impingement of sputtered atoms and/or energetic Ar neutrals reflected from the Zr-Y target surfaces. The film texture was not as strong when only one sputter source was used. Sputtering geometries useful for large-scale deposition of textured films are described.