In this study, the characteristics of two relatively fast pore decoration techniques used for studying corrosion susceptibility of thin film disks with the structure CoCrTa/Cr/NiP/AlMg are discussed. The first technique employs HCl vapor. Since the HCl vapor reacts with both the cobalt alloy and the NiP layers, it has the capability of revealing pores in the sputtered layers with different sizes and depths that have an opening at the disk surface. The other technique uses a concentrated nitric acid solution. Because concentrated nitric acid reacts only extensively with the NiP layer, it is used to reveal the deeper pores in the sputtered layers with depth reaching the NiP layer. The tests are used to study the corrosion susceptibility of thin film disks with different substrate bias voltages during growth of the magnetic and chromium layers. By the use of these two accelerated chemical tests, the pinhole densities of sputtered films are found to decrease with increasing bias due to ion bombardment on the growing film that densifies the film structure. The porosity results obtained are compared with those conventional corrosion tests, including the environmental chamber test and hot water ion extraction. Good correlation among the different tests has been established.