Laser Induced Dielectric Breakdown for Chemical Vapor Deposition by Hydrogen Reduction of Volatile Boron Halides BCl(3)and BF3 (vol 40, pg 1145, 2020)

Gornushkin IB; Sennikov PG; Kornev RA; Ermakov AA; Shkrunin VE

Plasma Chemistry and Plasma Processing, Vol.40, No.6, 1639-1640, 2020

DOI10.1007/s11090-020-10107-w Export Citation

Laser Induced Dielectric Breakdown for Chemical Vapor Deposition by Hydrogen Reduction of Volatile Boron Halides BCl(3)and BF3 (vol 40, pg 1145, 2020)

Gornushkin IB, Sennikov PG, Kornev RA, Ermakov AA, Shkrunin VE

The original version of this article unfortunately contained a mistake in the abstract section and figure 7. The corrections are listed below.