Journal of Vacuum Science & Technology A, Vol.13, No.2, 195-199, 1995
Positive and Negative Direct-Current Bias Effects on the Microstructures and Physical-Properties of Hydrogenated Amorphous-Carbon Films Prepared by Radio-Frequency Plasma Chemical-Vapor-Deposition
Keywords:RF-PLASMA;GLOW-DISCHARGE;DIAMOND SYNTHESIS;MICROWAVE PLASMA;SUBSTRATE BIAS;THIN-FILMS;ABSORPTION