Previous Article Next Article Table of Contents Journal of Vacuum Science & Technology A, Vol.13, No.1, 54-62, 1995 DOI10.1116/1.579443 Export Citation Kinetics and Mechanism of Plasma Oxidation of Tantalum Silicides Gomezsanroman R, Perezcasero R, Perriere J, Enard JP, Martinezduart JM Keywords:THERMAL-OXIDATION;OXYGEN PLASMA;FILMS;SILICON;SI Please enable JavaScript to view the comments powered by Disqus.
