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Journal of Vacuum Science & Technology A, Vol.13, No.1, 1-10, 1995
Adsorption and Decomposition of Trichlorosilane and Trichlorogermane on Porous Silicon and Si(100)2X1 Surfaces
Keywords:CHEMICAL VAPOR-DEPOSITION;ATOMIC LAYER EPITAXY;INDUCED THERMAL-DESORPTION;HYDROGEN DESORPTION;LOW-PRESSURE;INFRARED-SPECTROSCOPY;ATMOSPHERIC-PRESSURE;ULTRAHIGH-VACUUM;SI(111) 7X7;KINETICS