A new electron beam source designed specifically for cutting edge technology has been developed. The source is tailored for today’s demanding applications providing precise control of very low deposition rates for research and molecular beam epitaxy processes while retaining the ability to operate at high power levels for production systems. Applications consist of the evaporation of all metals, subliming materials, and dielectric materials in both high and ultrahigh vacuum environments. Evaluation of the sources performance during deposition will be displayed, together with a discussion about new design features. In addition the latest advances in solid state power supplies and controllers for electron beam deposition processes will be reviewed.