Journal of the Electrochemical Society, Vol.141, No.9, 2369-2373, 1994
Structure of the Copper-Monolayer Platinum-Electrode Interface as Measured in in-Situ X-Ray-Absorption Spectroscopy
Using a large polycrystalline Pt film electrode with one layer of electrochemically adsorbed Cu, we have measured the EXAFS of Cu at the K edge through a grazing-incidence fluorescence-detection experiment while the sample was under electrochemical control. The quality of the data permit reliable analysis of the k(chi) spectrum up to 800 eV above the K edge. Measurements with x-ray electric field vector parallel and perpendicular to the surface were made on the same monolayer. The results indicate that the neighbors of Cu are : O at 2.06 angstrom, Pt at 2.58 angstrom, and Cu at 2.62 angstrom. These are similar to what is expected from considerations of metallic or covalent radii.
Keywords:UNDERPOTENTIALLY DEPOSITED COPPER;SCANNING TUNNELING MICROSCOPY;FINE-STRUCTURE SPECTROSCOPY;ULTRATHIN CU FILMS;SURFACE EXAFS;CRYSTAL-SURFACES;PT(111);GOLD;ADSORPTION;ELECTROCHEMISTRY