Selective reaction of (Ad)GeH3 (Ad = adamantyl) with a Rh/SiO2 surface has been carried out at 50 degrees C. The surface reaction and the characterization of the surface organogermanium complex have been followed by infrared spectroscopy, surface microanalysis, analysis of the gases evolved during the surface reaction, thermal decomposition of the surface organometallic complex, and use of CO as a molecular probe. In the absence of metallic rhodium, (Ad)GeH3 does not react significantly with the silica surface at room temperature. It is only reversibly adsorbed, and the molecular interaction responsible for this adsorption process is a hydrogen-bonding interaction between either the C-H or Ge-H atoms and the surface silanols.