In this study, we demonstrated the formation of a new type of AuAg@Ag nanostructure in titanium nitride (TiN) thin films using sequential implantation of Au and Ag ions. The TiN films deposited by DC reactive sputtering were sequentially implanted with 200 keV gold ions at fluences of 0.5 x 10(16) and 1 x 10(16) ions/cm(2) and 150 keV silver ions at fluences of 1 x 10(16), 2 x 10(16), 3 x 10(16), and 4 x 10(16) ions/cm(2). Formation of spherical-like particles with dimensions below 10 nm, homogeneously distributed along the ion track of implanted ions is verified by high resolution transmission electron microscopy. Specific nanostructure containing Au-Ag alloy in the center of the particle and only silver on the periphery was found in the TiN sample sequentially implanted with 1.0 x 10(16) ions/cm(2) of Au and 4 x 10(16) ions/cm(2) of Ag using high angle annular dark field scanning electron microscopy together with elemental mapping analysis. On the other hand, for the sample implanted with 0.5 x 10(16) ions/cm(2) of Au and 4 x 10(16) ions/cm(2) of Ag only formation of Au-Ag alloy was observed. A mechanism for the formation of a new type core/shell nanostructure in ion implanted TiN thin films is proposed. By varying the implantation fluence of the gold and silver ions properly, the optimized experimental parameters for creation of a specific AuAg@Ag core/shell nanoparticles were achieved.