A method for preparing surface-enhanced Raman scattering substrate with high sensitivity is presented in this study. The new type of substrate was fabricated by depositing silver nanoparticles, using electroplating, onto the surface of boron-doped single silicon with a texture of inverted pyramid arrays prepared by the technology of texturization. In order to evaluate the enhancement ability of the substrate, a test of Raman scattering with Rhodamine 6G (R6G) as probe molecules was performed and the results showed a high sensitivity, good uniformity and stability. Relay on the enhancement by the substrate, the Raman scattering signal of R6G with a high signal-to-noise ratio could be detected out at a rather low concentration level of 10(-18) M. The performance of the substrate is also simulated and illustrated using the software COMSOL Multiphysics. The electric field is greatly enhanced on the surface of silicon wafer with inverted pyramid morphology, especially in pits. According to the electromagnetic enhancement theory, the calculated Raman enhancement factor is as high as 10(11), which strongly supports the experimental data. This work may offer a novel and practical method for Raman spectroscopy application in trace analysis.