The vertically aligned carbon nanoflakes thin films were synthesized on Si (100) and alkali free borosilicate glass substrates at relatively low substrate temperature of 400 degrees C, without any catalyst or surface pre-treatment, using hot-wire chemical vapor deposition (HWCVD) technique. Raman Spectroscopy studies reveal that the crystallinity of the films increases with increase in process pressure. Our studies show that HWCVD is a versatile technique for the synthesis of these films at low temperature compared to plasma enhanced CVD on both semiconducting Si as well as insulating glass substrates.