Patterned microstructures are among the basic micro features that are indispensable in improving the tribological performance and dependability of various mechanical components especially Micro-Electro-Mechanical Systems (MEMS). Through Mask Electrochemical Micromachining (TMEMM) is a feasible process for fabricating micro-patterned arrays with controlled dimension, location and density by maintaining suitable surface texture. In this paper, appropriate machining parameters along with optimal electrolyte combination have been utilized for achieving patterned arrays in the form of micro-dimples and micro-square features. Low aspect ratio mask made of a negative PR (AZ 4903) is being introduced during TMEMM due to its low cost, availability and chemical resistance. Pattern of micro-holes with an average diameter of 65 mu m as well as micro-squares with a side length of 65 mu m imprinted on the mask are being replicated over SS304 substrate with substantial repeatability. The influence of two major Electrochemical Micromachining (EMM) parameters viz. duty cycle and machining time are investigated on the machining accuracy and surface properties of the micro-dimples generated with mask of lean thicknesses. Circular micro-dimples with an undercut of 29.15 mu m, depth 44.10 mu m and R-a 0.091 mu m and square micro-dimples possessing 32.63 mu m undercut, 40.24 mu m depth and 0.081 mu m R-a have been successfully fabricated on SS304 by this process of TMEMM. (C) 2019 The Electrochemical Society.