Atomic layer deposition: A versatile method to enhance TiO2 nanoparticles interconnection of dye-sensitized solar cell at low temperature

Yuelong Li; Linchuan Ma; Youngseok Yoo; Guangcai Wang; Xiaodan Zhang; Min Jae Ko

Journal of Industrial and Engineering Chemistry, Vol.73, 351-356, May, 2019

DOI10.1016/j.jiec.2019.02.006 Export Citation

Atomic layer deposition: A versatile method to enhance TiO2 nanoparticles interconnection of dye-sensitized solar cell at low temperature

Yuelong Li^†, Linchuan Ma¹, Youngseok Yoo², Guangcai Wang, Xiaodan Zhang, and Min Jae Ko^{2, †}

Institute of Photoelectronic Thin Film Devices and Technology, Nankai University, Key Laboratory of Photoelectronic Thin Film Devices and Technology of Tianjin, #38 Tongyan Road, Jinnan District, Tianjin 300350, PR China
¹Electronic Information Laboratorial Teaching Center of Nankai University, #38 Tongyan Road, Jinnan District, Tianjin 300350, PR China
²Department of Chemical Engineering, Hanyang University, 222 Wangsimni-ro, Seongdong-gu, Seoul 04763, Republic of Korea

E-mail:,

A thin TiO2 layer is introduced by atomic layer deposition (ALD) onto the surface of TiO2 host-particles at low-temperature, which serves as binding layer to enhance the interconnection of TiO2 host-nanoparticles of photoelectrode or adhesion of photoelectrode with substrate. The power conversion efficiency of 4.63%, corresponding to 50% enhancement compared with 3.09% of reference cell, is achieved from ALD-treated cell. The electrochemical impedance spectroscopy confirms the reduced internal resistance and much longer electron lifetime in ALD-treated cell. These results suggest that ALD technique can be used as an effective and precise technique to construct efficient dye-sensitized solar cells at low-temperature.

Keywords:Dye-sensitized solar cell;Atomic layer deposition;Low temperature process;Titanium dioxide;Interparticles connection

[References]

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Li Y, Yoo K, Lee DK, Kim JY, Kim H, Kim BS, Ko MJ, Nanoscale, 5, 4711 (2013)
Li Y, Lee W, Lee DK, Kim K, Park NG, Ko MJ, Appl. Phys. Lett., 98, 103301 (2011)
Li Y, Carretero-Palacios S, Yoo K, Kim JH, Jimenez-Solano A, Lee CH, Miguez H, Ko MJ, Energy. Environ. Sci., 9, 2061 (2016)
Yamaguchi T, Tobe N, Matsumoto D, Nagai T, Arakawa H, Sol. Energy Mater. Sol. Cells, 94(5), 812 (2010)
Zhang DS, Yoshida T, Oekermann T, Furuta K, Minoura H, Adv. Funct. Mater., 16(9), 1228 (2006)
Durr M, Schmid A, Obermaier M, Rosselli S, Yasuda A, Nelles G, Nat. Mater., 4(8), 607 (2005)
Kim DH, Losego MD, Peng Q, Parsons GN, Adv. Mater. Inter., 3, 160003 (2016)
Pheamhom R, Sunwoo C, Kim DH, J. Vac. Sci. Technol. A, 24(4), 1535 (2006)
Kim WD, Hwang GW, Kwon OS, Kim SK, Cho M, Jeong DS, Lee SW, Seo MH, Hwang CS, Min YS, Cho YJ, J. Electrochem. Soc., 152(8), C552 (2005)
Yoo B, Kim KJ, Bang SY, Ko MJ, Kim K, Park NG, J. Electroanal. Chem., 638(1), 161 (2010)
Kim DH, Woodroof M, Lee K, Parsons GN, ChemSusChem, 6, 1014 (2013)
Kim B, Li Y, Jung H, Kim JY, Lee DK, Kim B, Son HJ, Kim DH, Ko MJ, Nano, 9, 144001 (2014)
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Han L, Koide N, Chiba Y, Mitate T, Appl. Phys. Lett., 84, 2433 (2004)
Hoshikawa T, Yamada M, Kikuchi R, Eguchi K, J. Electrochem. Soc., 152(2), E68 (2005)
Fabregat-Santiago F, Garcia-Belmonte C, Mora-Sero I, Bisquert J, Phys. Chem. Chem. Phys., 13, 9083 (2011)
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[Referenced By]

[1] Kijitori Y, Ikegami M, Miyasaka T, Chem. Lett., 36(1), 190 (2007)

[2] Weerasinghe HC, Franks GV, Plessis JD, Simon GP, Cheng YB, J. Mater. Chem., 20, 9954 (2010)

[3] Li Y, Yoo K, Lee DK, Kim JY, Kim H, Kim BS, Ko MJ, Nanoscale, 5, 4711 (2013)

[4] Li Y, Lee W, Lee DK, Kim K, Park NG, Ko MJ, Appl. Phys. Lett., 98, 103301 (2011)

[5] Li Y, Carretero-Palacios S, Yoo K, Kim JH, Jimenez-Solano A, Lee CH, Miguez H, Ko MJ, Energy. Environ. Sci., 9, 2061 (2016)

[6] Yamaguchi T, Tobe N, Matsumoto D, Nagai T, Arakawa H, Sol. Energy Mater. Sol. Cells, 94(5), 812 (2010)

[7] Zhang DS, Yoshida T, Oekermann T, Furuta K, Minoura H, Adv. Funct. Mater., 16(9), 1228 (2006)

[8] Durr M, Schmid A, Obermaier M, Rosselli S, Yasuda A, Nelles G, Nat. Mater., 4(8), 607 (2005)

[9] Kim DH, Losego MD, Peng Q, Parsons GN, Adv. Mater. Inter., 3, 160003 (2016)

[10] Pheamhom R, Sunwoo C, Kim DH, J. Vac. Sci. Technol. A, 24(4), 1535 (2006)

[11] Kim WD, Hwang GW, Kwon OS, Kim SK, Cho M, Jeong DS, Lee SW, Seo MH, Hwang CS, Min YS, Cho YJ, J. Electrochem. Soc., 152(8), C552 (2005)

[12] Yoo B, Kim KJ, Bang SY, Ko MJ, Kim K, Park NG, J. Electroanal. Chem., 638(1), 161 (2010)

[13] Kim DH, Woodroof M, Lee K, Parsons GN, ChemSusChem, 6, 1014 (2013)

[14] Kim B, Li Y, Jung H, Kim JY, Lee DK, Kim B, Son HJ, Kim DH, Ko MJ, Nano, 9, 144001 (2014)

[15] Kern R, Sastrawan R, Ferber J, Stangl R, Luther J, Electrochim. Acta, 47(26), 4213 (2002)

[16] Han L, Koide N, Chiba Y, Mitate T, Appl. Phys. Lett., 84, 2433 (2004)

[17] Hoshikawa T, Yamada M, Kikuchi R, Eguchi K, J. Electrochem. Soc., 152(2), E68 (2005)

[18] Fabregat-Santiago F, Garcia-Belmonte C, Mora-Sero I, Bisquert J, Phys. Chem. Chem. Phys., 13, 9083 (2011)

[19] Wang Q, Ito S, Gratzel M, Fabregat-Santiago F, Mora-Sero I, Bisquert J, Bessho T, Imai H, J. Phys. Chem. B, 110(50), 25210 (2006)