Nanolaminates of ZrO2 and Co3O4 were atomic layer deposited on silicon and titanium nitride at 300 degrees C. Films were confirmed to be polycrystalline in the as-deposited state, with the cubic phase dominating in both oxides. All films exhibited resistive switching characteristics and charge polarization and ferromagnetic behavior. Also, the relative permittivities of the films were measured and the dispersion functions modelled.