We have carried out the first systematic study of the effects of ultraviolet light, both alone and in combination with visible white light, on Turing patterns in the chlorine dioxide-iodine-malonic acid (CDIMA) reaction. The ultraviolet light used has a sharp peak at 368 nm and can perturb the system selectively. It primarily decomposes chlorine dioxide in a zeroth-order reaction, and when it is used to illuminate Turing patterns, shrunken spots are formed with an imperfect hexagonal arrangement. The ultraviolet light competes directly with the visible white light via the photoreaction with dissolved chlorine dioxide, which prevents the total suppression of patterns at intermediate intensities of white light. These results suggest that specific wavelengths of light in the ultraviolet spectrum selectively modify the chemistry behind the pattern formation and can be utilized to generate novel self-organized structures under forcing conditions. We propose a modified Lengyel-Epstein model to incorporate the effect of ultraviolet illumination and obtain good qualitative agreement between simulations and experiments. These results support the idea that chlorine dioxide photoreaction is a key step in modulating CDIMA patterns under ultraviolet illumination.