Korean Journal of Materials Research, Vol.29, No.2, 106-115, February, 2019
동시소성형 감전소자의 개발
Development of Heterojunction Electric Shock Protector Device by Co-firing
E-mail:
Recently, metal cases are widely used in smart phones for their luxurious color and texture. However, when a metal case is used, electric shock may occur during charging. Chip capacitors of various values are used to prevent the electric shock. However, chip capacitors are vulnerable to electrostatic discharge(ESD) generated by the human body, which often causes insulation breakdown during use. This breakdown can be eliminated with a high-voltage chip varistor over 340V, but when the varistor voltage is high, the capacitance is limited to about 2pF. If a chip capacitor with a high dielectric constant and a chip varistor with a high voltage can be combined, it is possible to obtain a new device capable of coping with electric shock and ESD with various capacitive values. Usually, varistors and capacitors differ in composition, which causes different shrinkage during co-firing, and therefore camber, internal crack, delamination and separation may occur after sintering. In addition, varistor characteristics may not be realized due to the diffusion of unwanted elements into the varistor during firing. Various elements are added to control shrinkage. In addition, a buffer layer is inserted in the middle of the varistor-capacitor junction to prevent diffusion during firing, thereby developing a co-fired product with desirable characteristics.
- Xu Z, Yu L, Xu X, Miao J, Jiang Y, Appl. Phys. Lett., 104, 192903 (2014)
- Sun W, Zhang L, Huang X, Liu J, Wang H, Bu Y, Comput. Mater. Sci., 136, 157 (2017)
- Seo S, Lee MJ, Seo DH, Jeoung EJ, Suh DS, Joung YS, Appl. Phys. Lett., 85, 5655 (2004)
- Moreno C, Munuera C, Valencia S, Kronast F, Obradors X, Ocal C, Nano Lett., 10, 3828 (2010)
- Hasegawa T, Terabe K, Tsuruoka T, Aono M, Adv. Mater., 24(2), 252 (2012)
- Symanczyk R, Bruchhaus R, Dittrich R, Kund M, IEEE Electron. Device Lett., 30, 876 (2009)
- Cho B, Song S, Ji Y, Kim TW, Lee T, Adv. Funct. Mater., 21(15), 2806 (2011)
- Jeong DS, Schroeder H, Waser R, Phys. Rev. B, 79, 195317 (2009)
- Lee MJ, Lee CB, Lee D, Lee SR, Chang M, Hur JH, Kim YB, Kim CJ, Seo DH, Seo S, Chung UI, Yoo IK, Kim K, Nat. Mater., 10(8), 625 (2011)
- Gupta TK, J. Am. Ceram. Soc., 73, 1817 (1990)