Preparation of EVOH and aramid-modified polar nylon membrane for the removal of hard and soft colloidal particles

Jayalakshmi Ayyavoo; In-Chul Kim; Young-Nam Kwon

Journal of Industrial and Engineering Chemistry, Vol.65, 72-81, September, 2018

DOI10.1016/j.jiec.2018.04.014 Export Citation

Preparation of EVOH and aramid-modified polar nylon membrane for the removal of hard and soft colloidal particles

Jayalakshmi Ayyavoo, In-Chul Kim^{1, †}, and Young-Nam Kwon^†

School of Urban and Environmental Engineering, Ulsan National Institute of Science and Technology, Ulsan 689-798, Republic of Korea
¹Environment & Resources Research Center, Korea Research Institute Chemical Technology, Daejeon 305-606, Republic of Korea

E-mail:,

For the efficient particle removal in an aged semiconductor photoresist solution, a nylon membrane having micro-sized pores was modified into membranes having nano-sized pores. Polyethylene(co-vinyl alcohol) and aramid were used as pore fillers to modify the membrane. The removable capability of soft and hard nano-colloids was systematically investigated. Porosity minimization, improved rejection efficiency, solvent resistance, and enhanced wettability were observed at the modified nylon composite membranes. The aramid pore-filled membrane showed higher rejection (>95%) than the virgin or the EVOH modified membrane, showing good feasibility for use as a separator for particle removal in a semiconductor process.

Keywords:Aramid;Rejection;Pore size;Gold colloids;Pd.PVP nanoparticles

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[1] Ohring M, Academic Press, San Diego, p.105 Chapter 3. 1998.

[2] Pease RFC, Stephen Y, Lithography and other patterning techniques for future electronics, Conference Proceedings, 2008.

[3] Allen RD, Wallraff GM, Hofer DC, Kunz RR, IBM J. Res. Dev., 41, 95 (1997)

[4] Ebnesajjad S, William Andrew Publishing, Oxford, p. 640 (Chapter 19) 2015.

[5] Williams ME, William Andrew Publishing, Park Ridge, NJ, p. 343 1995.

[6] Bleakie A, Djurdjanovic D, Comput. Ind., 64, 625 (2013)

[7] Bleakie A, Djurdjanovic D, Comput. Ind., 64, 203 (2013)

[8] Huang Y, Zha XF, Lee J, Liu C, Mech. Syst. Signal Proc., 34, 277 (2013)

[9] Liu S, Xu YJ, Sci. Rep., 6, 22742 (2016)

[10] Filtr. Sep. 36, 10 (1999).

[11] Azerrad SP, Eversloh CL, Gilboa M, Schulz M, Ternes T, Dosoretz CG, Water Res., 103, 424 (2016)

[12] Wu CR, Liu SH, Wang ZY, Zhang JH, Wang X, Lu XL, Jia Y, Hung WS, Lee KR, J. Membr. Sci., 517, 64 (2016)

[13] Nicolini JV, Borges CP, Ferraz HC, Sep. Purif. Technol., 171, 238 (2016)

[14] Nguyen TPN, Jun BM, Kwon YN, J. Membr. Sci., 523, 111 (2017)

[15] Jayalakshmi A, Kim IC, Kwon YN, J. Ind. Eng. Chem., 51, 54 (2017)

[16] Umeda T, Tsuzuki S, Numaguchi T, Adv. Resist Mater. Process. Technol. XXVI, 7273, 72734B (2009)

[17] Osada Y, Kajiwari K, Fushimi T, Irasa O, Hirokawa Y, Matsunaga T, Shimomura T, Wang L, Ishida H, Academic Press A Harcourt Science and Techmology Company, San Diego, CA, p.413 2001

[18] Huang LW, McCutcheon JR, J. Membr. Sci., 457, 162 (2014)

[19] Huang LW, Bui NN, Meyering MT, Hamlin TJ, McCutcheon JR, J. Membr. Sci., 437, 141 (2013)

[20] Tang Y, Hu X, Zhang X, Guo D, Zhang J, Kong F, Carbohydr. Polym., 151, 752 (2016)

[21] Chen X, Wang Y, Dai G, Peng J, Li J, Shi M, Zhai M, Radiat. Phys. Chem., 127, 256 (2016)

[22] Maksym-Bebenek P, Biela T, Neugebauer D, React. Funct. Polym., 82, 33 (2014)

[23] Pathak MTGS, Kwong RC, Mercado K, Prakash GKS, Olah GA, Thompson ME, Chem. Mater., 12, 1985 (2000)

[24] Jayalakshmi A, Kim IC, Kwon YN, RSC Adv., 5, 48290 (2015)

[25] Nathalia PDV, Haro K, J. Clean Prod., 154, 214 (2017)

[26] Guy KA, Xu H, Yang JC, Werth CJ, Shapley JR, J. Phys. Chem. C, 113, 8177 (2009)

[27] Choo HP, Liew KY, Liu H, J. Mater. Chem., 12, 934 (2002)

[28] Jayalakshmi A, Kim IC, Kwon YN, Chin. J. Chem. Eng., 25(7), 931 (2017)