Amorphous hydrogenated oxygenated chlorinated carbon materials with and without silicon were produced by PECVD at deposition rates of up to 150 nm min(-1). Surface roughness, morphology and contact angle were almost independent of the main system parameter, namely the partial pressure of CHCl3 in the plasma feed, C-cl. Infrared reflection absorption spectroscopy (IRRAS) of the films revealed the presence of C=O and C=C bonding in all the chlorinated films. IRRAS spectra also showed the presence of C-Cl bonds in the most chlorinated a-C:H:O:Cl films. Hydration of Si-CI to Si-OH occurs in the a-C:H:Si:O:Cl films. As revealed by Energy-dispersive X-ray spectroscopy (EDS) the Cl content increases and the O content decreases as C-cl increases. Under the range of conditions used, [Cl] reached maxima of similar to 32 at.% and 25 at.%, respectively, for the series of a-C:H:O:Cl and the a-C:H:Si:O:C1 films. For the aC:H:Si:O:Cl films the Si content decreases with increasing Ca. Optical properties were calculated from Ultraviolet-visible near infrared spectral data. Refractive indices varied between-1.52 and 1.78, depending on Co. The Tauc gaps can be selected by a suitable choice of Ca in the range of roughly 13-2.6 eV. (C) 2018 Elsevier B.V. All rights reserved.