Low energy implantation of Ni and Fe into SiO2 films resulted in the formation of superparamagnetic Ni1-xFex nanoparticles for Ni fluences of 2 x 10(16) at./cm(2), 4 x 10(16) at./cm(2), and 6 x 10(16) at./cm(2) where the Ni: Fe fluence ratios were 47:56, 53:47, and 63:37, respectively. Small similar to 5 nm Ni1-xFex nanoparticles were dispersed in the implantation region for the lowest Ni fluence. Increasing the Ni fluence resulted in a different nanoparticle morphology where larger nanoparticles appeared at the surface and small Ni1-xFex segregated regions to a depth of similar to 20 nm. The average nanoparticle size in the surface region was similar to 8 nm for Ni fluences of 4 x 10(16) at./cm(2) and 6 x 10(16) at./cm(2). The highest Ni fluence film also had smaller Ni1-xFex nanoparticles at a depth of similar to 11 nm. The largest high field moment per implanted ion was found for the intermediate Ni fluence. The spin-stiffness was similar for all fluences and smaller than that expected for bulk Ni1-xFex. A small spin-disordered region was evident with the same low spin-freezing temperatures that may be due to a similar spin-disordered shells. dM/dH at 300 K was estimated and found to be highest for a Ni fluence of 4 x 10(16) at./cm(2) where it reached 62. (c) 2018 Elsevier B.V. All rights reserved.