Quantum dots (QDs) possess attractive optoelectronic properties and have been intensively researched for various applications. Interest in QDs has been driven by their tunable properties, low-cost processing techniques using low-cost materials, and the compatibility of the material for different purposes. A clear understanding of the different processing techniques used for QDs is required to efficiently explore their unique properties and further improve their performance. QDs can potentially improve the power conversion efficiency (PCE) of quantum dot sensitized solar cells (QDSSCs). However, surface phenomena arising from the use of non-uniform or poor deposition methods of QDs tend to impede the performance of QDSSCs. This review highlights the most frequently used processing techniques for QD materials. Specific focus is placed on the successive ionic layer adsorption and reaction (SILAR) method as the preferred processing method for QDs. The attractiveness of the SILAR method and the current performance of QDSSCs are discussed. The three main factors contributing to the performance of QDs processed by SILAR, namely the number of cycles used, the concentration of the precursor solution, and the dipping time reaction, are discussed. Optimization of QD films through precise deposition based on SILAR improves the surface quality and performance of QD-based devices.