Thin plasma polymer layers were produced employing feed gas of CHCl3(chloroform) and SiH4 in an rf-plasma reactor respectively. The CHCl3 and SiH4 were plasma-polymerized to yield fims containing silicon residues. The plasma polymer membrane was investigated by elemental analysis, FT-IR(infrared spectroscopy), SEM(scanning electron microscopy) for physico-chemical analysis. The elemental composition of the formed polymers depended on the composition of the starting gases.