In this study, tantalum (Ta) thin films deposited (by magnetron sputtering) on CoCrMo alloy substrates were studied using X-Ray Diffraction, Scanning Electron Microscopy and Rockwell C indentation tests. The results show that alpha-Ta single phase thin films, the desired phase for orthopedic implant applications, with low adhesion forms at substrate temperature of 400 degrees C or above while a mixture of alpha-Ta and beta-Ta forms at substrate temperature lower than 400 degrees C. A negative bias of 78 V applied to substrate results in development of adherent beta-Ta thin film at room temperature. Based on the results, a multilayered gradient Ta thin film, beta-Ta/beta-Ta + alpha-Ta/alpha-Ta, with controlled structure has been developed on biomedical CoCrMo alloy sheets. The film shows high adhesion, which is promising for biomedical applications.