Applied Surface Science, Vol.418, 517-521, 2017
In situ monitoring of electrical resistance during deposition of Ag and Al thin films by pulsed laser deposition: Comparative study
In this study, the growth by pulsed laser deposition of thin films of nanometer thickness as well as clusters is presented. Two kinds of metals, namely Ag and Al, are investigated because of their different growth processes on SiO2. We show that by tuning the deposition rate and the background atmosphere, it is easily possible to obtain Ag clusters that exhibit plasmonic resonances at wavelengths shorter than 500 nm. It is further demonstrated that Al tends to perfectly wet the substrate when deposited under vacuum or gas pressure. In situ electrical resistance measurements are used to follow the growth during deposition, and conventional analysis techniques (AFM, SEM, absorption and ellipsometry spectroscopy) are used to control their properties. (C) 2016 Elsevier B.V. All rights reserved.