In this study, the influence of microstructure on the properties of Ga-doped ZnO (GZO) films deposited by radio frequency magnetron sputtering was investigated by a combination of microstructural control and post-deposition annealing. GZO films deposited on bare glass substrates at room temperature (RT) showed poor c-axis orientation; however, insertion of a thin GZO layer deposited at 200 degrees C as a self-buffer layer resulted in high c-axis orientation. Regardless of the microstructure, the carrier concentration, Hall mobility, and optical transmittance of the GZO film deposited at RT were lower than those of the GZO film deposited at a higher substrate temperature of 200 degrees C, because of the presence of defects in the former film. The carrier concentration and optical transmittance of both the GZO film with the self-buffer layer and the GZO film without the self-buffer layer increased after the post-deposition annealing. However, a significant improvement of the Hall mobility was observed only for the highly c-axis oriented GZO films deposited on the self-buffer layer. Evaluation of the contribution of grain boundary scattering to the Hallmobility by employing opticalmobility as the measure demonstrated that the contribution of grain boundary scattering clearly existed in the case of the GZO films without the self-buffer layer but it was almost negligible in the case of well-oriented GZO films deposited on the self-buffer layer. (C) 2016 Elsevier B.V. All rights reserved.