V-Cr-Y alloy is a material for hydrogen separation membrane possessing high transmittance and selectivity. In order to increase the rate of hydrogen permeation flux through the membrane, V-Cr-Y thin film was prepared using a sputtering technique and was investigated focusing on its basic properties. Thin film was deposited on a silicon wafer using a target including V (89.8%), Cr (10.0%) and Y(0.2%), and results of EDS analysis confirm that the ratio of metal in thin film agrees with that in the target. Higher sputtering temperature and power resulted in more rapid growth rate of the thin film and larger size of the crystals, and denser and finer crystal structure was observed when lower pressure was applied. An optimal sputtering condition was found with RF, 2mTorr, 300W and ambient temperature, and a suitable V-Cr-Y thin film for hydrogen separation was obtained upon heat treatment of the thin film prepared in this way.