Newly synthesized trinuclear bimetallic precursor [Mn2Ti(mu 3-O) (TFA)6 (THF)(3)] (1) (where TFA = trifluoroacetato and THE = tetrahydrofuran) was successfully used to develop Mn2O3 -TiO2 (MT) composite thin films by aerosol assisted chemical vapour deposition (AACVD). The Mn2O3 -TiO2 composite thin films developed at four different temperatures of 400, 450, 500 and 550 degrees C were characterized by X-ray diffraction (XRD) and their elemental composition was affirmed by energy dispersive X-ray spectroscopy (EDX). Further field emission gun-scanning electron microscopy (FEG-SEM), atomic force microscopy (AFM), UV-visible absorption spectrophotometry and photoelectrochemical properties were investigated to compare the properties and efficiency of thin films fabricated at 400, 450, 500 and 550 degrees C. The FEG-SEM and AFM analyses illustrated that the morphology and surface roughness of the thin films significantly depend on the deposition temperature. Films deposited at 500 degrees C shows agglomerated spinal column scattered vertically on the FTO-coated glass substrate. The direct optical band gap energies of 2.80, 2.52, 2.75 and 2.90 eV for the films fabricated at 400, 450, 500 and 550 degrees C respectively were found. Photo-oxidation of water via Mn2O3-TiO2 thin films was carried out under simulated solar irradiation of AM 1.5 G (100 mW/cm(2)) in 0.5 M Na2SO4 using three-electrode photoelectrochemical cell. The films deposited at 500 degrees C exhibited a better photocurrent density of -1.3 mA cm(-2) at 0.7 V as compared to the rest of the films grown at different temperatures. (C) 2016 Hydrogen Energy Publications LLC. Published by Elsevier Ltd. All rights reserved.