The aim of the study is to develop a more economical and easier method for obtaining ZrO2 thin films at lower temperature, unlike the ones mentioned in the literature. For this purpose, wet chemical synthesis methods have been tested and XRD, UV-VIS and SEM analysis of ZrO2 thin films have been performed. At the end of the analysis, we identified the best method and it has been found that the features of the films produced with this method were better than the films produced by using different reagents, as well as the films reported in the literature. Especially it has been observed that the transmittance of the film produced with this method were higher and better than the films in the literature and the others. In addition, refractive index of the film produced with this method was observed to be lower. Moreover, by using the same method Al/ZrO2/p-Si structure has been obtained and it has been compared with Al/p-Si reference structure in terms of electrical parameters. (C) 2016 Elsevier B.V. All rights reserved.