Two different surface electromagnetic wave assisted light concentrators are analyzed that can, in principle, be integrated into an array with each concentrator delivering optical power to a photoelectron emitting metal nanodot. Such arrays could be used as a source for multiple electron-beam lithography and inspection systems. The optical power concentrators, composed of metal structures embedded onto the surface of a quartz substrate, can, in principle, be tuned to any wavelength from UV to IR, capturing and enhancing broad area optical excitation and focusing it to subwavelength dimensions. Results of the finite difference time domain computer simulations of the structures are presented, and the optical power density enhancement factors at the focal spot are calculated to be over an order of magnitude for both structures. General methods for manipulating the spectral response are proposed and analyzed. (c) 2010 American Vacuum Society. [DOI: 10.1116/1.3504590]