In this article the authors present the potential of ionic liquid ion sources (ILISs) for direct microfabrication of silicon structures. The authors have developed a specific source geometry using the ionic liquid EMI-BF4 to obtain stable emission currents up to the 10 mu A regime. ILIS (EMI-BF4) engraving properties were then investigated. The results and the chemical analysis of the patterned substrates suggest that reactive ion species can be generated from ILIS. This possibility is of major interest to allow decisive advances in the field of focused ion beam applications. (C) 2010 American Vacuum Society. [DOI: 10.1116/1.3432125]