Effect of UV illumination on the fabrication of honeycomb-patterned film in the photo-responsive poly(methylmethacrylate/azobenzene) copolymer

Ju Yeon Park; M. Umashankar; Do Sung Huh

Macromolecular Research, Vol.24, No.4, 350-358, April, 2016

DOI10.1007/s13233-016-4046-0 Export Citation

Effect of UV illumination on the fabrication of honeycomb-patterned film in the photo-responsive poly(methylmethacrylate/azobenzene) copolymer

Ju Yeon Park, M. Umashankar, and Do Sung Huh^†

Department of Chemistry and Nano Science and Engineering, Center of Nano Manufacturing, Inje University, Kimhae, Gyeongnam, 50834, Korea

E-mail:

A photoresponsive poly(methylmethacrylate/azobenzene) copolymer was synthesized through the copolymerization of methylmethacrylate (MMA) with 6-[4-(4-dimethylaminophenylazo)phenoxy]-hexyl methacrylate (Azo-monomer) to see the effect of UV illumination on the formation of honeycomb-patterned films fabricated by casting the copolymer solution under humid conditions. The synthesized copolymer was characterized by Fourier transform infrared, UV-vis, and nuclear magnetic resonance spectroscopy. The honeycomb-patterned films obtained by UV illumination showed more highly ordered films. It is due to a photo-switched isomerization of the azobenzene component in the PMMA-Azo copolymer from trans- to cis-isomer, which induces the amphiphilicity of the copolymer solution by increased dipole moment.

Keywords:azobenzene copolymer;honeycomb-patterned film;UV illumination;dipole moment

[References]

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Widawski G, Rawiso M, Francois B, Nature, 369(6479), 387 (1994)
Maruyama N, Koito T, Nishida J, Sawadaishi T, Cieren X, Ijiro K, Karthaus O, Shimomura M, Thin Solid Films, 327, 854 (1998)
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Jung GH, Kim JK, Thinh PX, Huh DS, J. Photochem. Photobiol. A-Chem., 272, 6 (2013)
Kojima M, Nakanishi T, Hirai Y, Yabu H, Shimomura M, Chem. Commun., 46, 3970 (2010)
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Brown C, Acta Crystallogr., 21, 146 (1996)
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Kim BS, Basavaraja C, Jo EA, Kim DG, Huh DS, Polymer, 51(15), 3365 (2010)
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Shao J, Lei Y, Wen Z, Dou Y, Wang Z, J. Chem. Phys., 129, 16411 (2008)
Halabieh RH, Mermut O, Barret C, Pure Appl. Chem., 76, 1445 (2004)
Jiang W, Wang G, He Y, Wang X, An Y, Song Y, Jiang L, Chem. Commun., 28, 3550 (2005)
Kojima M, Hirai Y, Yabu H, Shimomura M, Polym. J., 41, 667 (2009)
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[Referenced By]

[1] Wijnhoven JE, Vos WL, Science, 281, 802 (1998)

[2] Bolognesi A, Botta C, Yunus S, Thin Solid Films, 492(1-2), 307 (2005)

[3] Langer R, Vacanti JP, Science, 260, 920 (1993)

[4] Hubbell JA, Nat. Biotechnol., 13, 565 (1995)

[5] Chen CS, Mrksich M, Huang S, Whitesides GM, Ingber DE, Science, 276(5317), 1425 (1997)

[6] Green AM, Jansen JA, van der Waerden JP, von Recum AF, J. Biomed. Mater. Res. A, 28, 647 (1994)

[7] Turner S, Kam L, Isaacson M, Craighead HG, Shain W, Turner J, J. Vac. Sci. Technol. B, 15(6), 2848 (1997)

[8] Moreau WM, Semiconductor Lithography: Principles and Materials, Plenum, New York, 1988.

[9] Kim E, Xia YN, Whitesides GM, Nature, 376(6541), 581 (1995)

[10] Widawski G, Rawiso M, Francois B, Nature, 369(6479), 387 (1994)

[11] Maruyama N, Koito T, Nishida J, Sawadaishi T, Cieren X, Ijiro K, Karthaus O, Shimomura M, Thin Solid Films, 327, 854 (1998)

[12] Yabu H, Shimomura M, Langmuir, 21(5), 1709 (2005)

[13] Jung GH, Kim JK, Thinh PX, Huh DS, J. Photochem. Photobiol. A-Chem., 272, 6 (2013)

[14] Kojima M, Nakanishi T, Hirai Y, Yabu H, Shimomura M, Chem. Commun., 46, 3970 (2010)

[15] Uznanski P, Kryszewski M, Thulstrup E, Eur. Polym. J., 27, 41 (1939)

[16] Hampson G, Robertson J, Woodward I, J. Chem. Soc., 171, 398 (1941)

[17] Brown C, Acta Crystallogr., 21, 146 (1996)

[18] Hartley G, Nature, 140, 281 (1937)

[19] Dong R, Zhu B, Zhou Y, Yan D, Zhu X, Angew. Chem.-Int. Edit., 51, 11633 (2012)

[20] Kim BS, Basavaraja C, Jo EA, Kim DG, Huh DS, Polymer, 51(15), 3365 (2010)

[21] Kim DG, Basavaraja C, Yamaguchi T, Huh DS, Polymer, 53(6), 1347 (2012)

[22] Pelfrey S, Cantu T, Papantonakis MR, Simonson DL, McGill RA, Macossay J, Polym. Chem., 1, 866 (2010)

[23] Morejon L, Mendizabal E, Delgado J, Davidenko N, Latin Am. Appl. Res., 35, 175 (2005)

[24] Tong X, Pelletier M, Lasia A, Zhao Y, Angew. Chem.-Int. Edit., 47, 3596 (2008)

[25] Shao J, Lei Y, Wen Z, Dou Y, Wang Z, J. Chem. Phys., 129, 16411 (2008)

[26] Halabieh RH, Mermut O, Barret C, Pure Appl. Chem., 76, 1445 (2004)

[27] Jiang W, Wang G, He Y, Wang X, An Y, Song Y, Jiang L, Chem. Commun., 28, 3550 (2005)

[28] Kojima M, Hirai Y, Yabu H, Shimomura M, Polym. J., 41, 667 (2009)

[29] Fukuhira Y, Yabu H, Ijiro K, Shimomura M, Soft Matters, 5, 2037 (2009)