Directed Self-Assembly of Poly(2-vinylpyridine)-b-polystyrene-b-poly(2-vinylpyridine) Triblock Copolymer with Sub-15 nm Spacing Line Patterns Using a Nanoimprinted Photoresist Template

Sun ZW; Chen ZB; Zhang WX; Choi J; Huang CL; Jeong GJ; Coughlin EB; Hsu YT; Yang XM; Lee KY; Kuo DS; Xiao SG; Russell TP

Advanced Materials, Vol.27, No.29, 4364-4370, 2015

DOI10.1002/adma.201501585 Export Citation

Directed Self-Assembly of Poly(2-vinylpyridine)-b-polystyrene-b-poly(2-vinylpyridine) Triblock Copolymer with Sub-15 nm Spacing Line Patterns Using a Nanoimprinted Photoresist Template

Sun ZW, Chen ZB, Zhang WX, Choi J, Huang CL, Jeong GJ, Coughlin EB, Hsu YT, Yang XM, Lee KY, Kuo DS, Xiao SG, Russell TP

Keywords:directed self-assembly;lamellar block copolymers;nanoimprint photoresist templates;salt complexes;solvent vapor annealing