Inducing nanostructure in conducting polymers and organically-derived nanostructured carbons provides additional control over their physical and electronic properties. These nanostructures have previously been produced by lithographic methods such as e-beam lithography, ion lithography and patterning involving pre-prepared masks. Self-assembly based on block copolymer self-segregation is another method for inducing nanostructures, one that contains a great deal of flexibility in the means of structure formation. Simply incorporating conducting moieties into one segment of a block copolymer via block extension or coupling is one primary strategy. Templating the conducting material or its precursor with block copolymer micelles and membranes, particularly when one segment of the copolymer exhibits affinity with the conducting polymer, is another heavily utilized method. This review discusses the use of block copolymers prepared by controlled radical polymerization as a tool for inducing nanostructure in conducting materials, from conducting polymers such as polythiophene and polypyrrole to carbon derived from organic polymer precursors such as resorcinol and polyacrylonitrile. Dividing principles include the type of conducting material, the method of self-assembly, the method of polymerization, and the block copolymer architecture.