Novel negative-type photocurable imide UV monomers were synthesized and characterized for an application to interdielectric layer in TFT-LCD array. Two different imide-type UV monomers were synthesized through 2 step reaction. In addition, alkali developable polymer matrix was also prepared by free radical random copolymerization of benzylmethacrylate and methacrylic acid in THF at 65 degrees C. It was found from photolithographic process that via-hole with good resolution were obtained using optimum formulations, suitable for spin coating process, of negative-type imide UV monomers, photoinitiator, UV oligomer, and alkali developable polymer matrix.