Previous Article Next Article Table of Contents Journal of Materials Science Letters, Vol.13, No.12, 860-862, 1994 DOI10.1007/BF00273230 Export Citation High-Rate Deposition of Titanium Silicides Under High Gas-Flow Rate by Chemical-Vapor-Deposition Kawai C Keywords:C-CL-H;SYSTEM Please enable JavaScript to view the comments powered by Disqus.
