화학공학소재연구정보센터
홈 로그인 로그아웃 연락처 사이트맵
Korean Journal of Materials Research, Vol.25, No.12, 647-654, December, 2015
DOI10.3740/MRSK.2015.25.12.647  Export Citation
대류성 자기조립법을 통한 폴리스티렌 비드 대면적 단일층 형성에 미치는 공정 변수 효과
Effect of Processing Parameters on the Formation of Large Area Self-Assembled Monolayer of Polystyrene Beads by a Convective Self-Assembly Method
서안나1, 2, 최지환3, 변재철2, 김원목1, 김인호1, 이경석1, 4, †
  • 1한국과학기술연구원 전자재료연구단
  • 2연세대학교 신소재공학과
  • 3고려대학교 신소재공학과
  • 4과학기술연합대학원 나노재료공학과
Ahn-na Seo1, 2, Ji-Hwan Choi3, Jae-chul Pyun2, Won Mok Kim1, 4, Inho Kim1, 4, and Kyeong-Seok Lee1, 5, †
  • 1Center for Electronic Materials Research, Korea Institute of Science and Technology, Seoul 136-791, Korea
  • 2Department of Materials Science and Engineering, Yonsei University, Seoul 120-749, Korea
  • 3Department of Materials Science and Engineering, Korea University, Seoul 136-713, Korea
  • 4, Korea
  • 5Department of Nanomaterials Science and Engineering, Korea University of Science and Technology, Daejon 305-330, Korea
E-mail:
Self-assembled monolayers(SAM) of microspheres such as silica and polystyrene(PS) beads have found widespread application in photonic crystals, sensors, and lithographic masks or templates. From a practical viewpoint, setting up a highthroughput process to form a SAM over large areas in a controllable manner is a key challenging issue. Various methods have been suggested including drop casting, spin coating, Langmuir Blodgett, and convective self-assembly(CSA) techniques. Among these, the CSA method has recently attracted attention due to its potential scalability to an automated high-throughput process. By controlling various parameters, this process can be precisely tuned to achieve well-ordered arrays of microspheres. In this study, using a restricted meniscus CSA method, we systematically investigate the effect of the processing parameters on the formation of large area self-assembled monolayers of PS beads. A way to provide hydrophilicity, a prerequisite for a CSA, to the surface of a hydrophobic photoresist layer, is presented in order to apply the SAM of the PS beads as a mask for photonic nanojet lithography.
Keywords:convective self-assembly method;polystyrene bead;large area monolayer;high-throughput process
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