화학공학소재연구정보센터
Korean Journal of Materials Research, Vol.9, No.8, 775-781, August, 1999
온도 및 전류밀도 변화에 따른 Pd도금막 특성변화 연구
Effects of Temperature and Current Density on the Characteristics of Electroplated Pd Films
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초록
균일하고 치밀한 미세구조를 갖는 Pd박막이 PdCl 2 를 사용하는 전기도금방법으로 제조되었다. 본 연구에서는 도금온도와 전류밀도가 주요 공정변수로서 고려되었고 이에 따른 음극효율 및 제조된 Pd도금막의 결정성, 형상 및 경도 등의 특성이 측정되었고, 이들간의 상호관계성이 검토되었다. 연구결과에 따르면, PdCl 2 를 사용하는 본 Pd전기도금 시스템에서는 5 0 ? C 와 5mA/ cm 2 의 조건이 도금막의 형상으로 볼 때, 최적의 도금조건이라고 간주된다. 최적 조건에서 제조된 Pd도금막의 경도는 약 600kg/ mm 2 이었다. 변수 및 특성간의 관계성 검토 결과, Pd막의 경도는 미세구조에 의해 큰 영향을 받지만, 결정의 배향성과의 연관성은 작은 것으로 해석된다.
alladium thin films of uniform and highly dense microstructure were prepared by the eletroplating method using novel PdCl 2 -based plating bath. Principal variables taken into account in this study were the plating temperature and the current density. Electroplated Pd films were characterized for Crystalline orientation, morphology and hardness. The optimal temperature and current density were found be 50 ? C and 5mA/ cm 2 , repectively. The measured hardness value for the Pd films when prepared under the optimal condition was as high as 600kg/ mm 2 . A correlation study between variables and properties seems to indicate that the hardness was significantly affected by the microstructure, but not by crystallite orientation.
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