반응성 스퍼터링법으로 제조된 anatase TiO  2   박막의 미세조직에 관한 연구

최용락; 김선화; 이건환; Yong-Lak Choi; Seon-Hwa Kim; Gun-Hwan Lee

Korean Journal of Materials Research, Vol.11, No.9, 751-758, September, 2001

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반응성 스퍼터링법으로 제조된 anatase TiO 2 박막의 미세조직에 관한 연구

Microstructures of Anatase TiO 2 Thin Films by Reactive Sputtering

최용락^†, 김선화¹, 이건환²

고기능성 자성재료 연구센터
¹순천향대학교 신소재.화학공학부
²한국기계연구원

Yong-Lak Choi^†, Seon-Hwa Kim¹, and Gun-Hwan Lee²

Research Center for Advanced Magnetic Materials, Taejeon 305-764, Korea
¹Division of Materials and Chemical Engineering, Soonchunhyang University, Asan, 336-745,, Korea
²Korea Institute of Machinery and Materials, Changwon 641-010, Korea

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Anatase TiO 2 thin films as a photocatalyst were prepared by the D.C reactive magnetron sputtering process. The TiO 2 thin films were deposited on Si(100) substrates under the various conditions : oxygen partial pressure, working pressure, substrate temperature, D.C power, and deposition time. The morphology of the TiO 2 thin films showed an island structure. At early stages of film growth, amorphous phase formed. However, during the further growth, columnar crystalline TiO 2 grains evolved. The crystallinity of the thin films depended on the oxygen partial pressure, the working pressure and the D.C. powers.

Keywords:Anatase TiO 2;reactive sputtering;TiO 2 thin film;Photocatalyst

[References]

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[1] Chun HD, J. Korean Soc. Environ. Eng., 16(7), 809 (1994)

[2] Kim SJ, Shin SK, J. Korean Soc. Environ. Eng., 21(2), 263 (1999)

[3] Kang JW, Park HS, Choei KH, J. Korean Soc. Environ. Eng., 17(3), 283 (1995)

[4] Fox MA, Dulay MT, Chem. Rev., 93, 341 (1993)

[5] Lee GD, Park JH, Ahn BH, Hong SS, J. Korean Soc. Environ. Eng., 20(11), 1599 (1998)

[6] Alexandrov P, Koprinarova J, Tcxlorov D, Elsevier Science Ltd., 47(11), 1333 (1996).

[7] Szczyrbowski J, Brauer G, Ruske M, Teschner G, Zmelty A, J. Non-Cryst. Solids, 218, 262 (1997)

[8] Sunada K, Kikuchi Y, hashimoto K, Fujishima A, Environ. Sci. Technol., 32(5), 726 (1998)

[9] Leaver KD, Chapman BN, Thin Films, Whkeham Publication, London, 29 (1971) .

[10] Yee KK, Int. Met. Rev., 23, 19 (1978)

[11] Leon Maissel and Reinhard Glang, Handbook of Thin F’ilm Technology, McGraw-Hill, 18-1(1970).

[12] Boschloo GK, Goossen A, Schoonman J, J. Electroanal. Chem., 144(4), 1311 (1997)

[13] Kim DH, Lee TK, Kim KB, Lee SW, Korean J. Mater. Res., 6(3), 282 (1996)

[14] Bunshah RF, Noyes Pub., Park Ridge, Ch.l. (1982).

[15] Burns GP, J. Appl. Phys., 65, 2095 (1989)

[16] Ro KH, Park W, Choe G, Ahn JC, Korean J. Mater. Res., 7(1), 21 (1997)

[17] Szczyrbowski J, Brauer G, Ruske M, Teschner G, Zmelty A, J. Non-Cryst. Solids, 218, 262 (1997)

[18] Cha YW, Lee KJ, Kim YH, Korean J. Mater. Res., 6(1), 49 (1996)

[19] Thornton JA, J. Vac. Sci. Technol. A, 4, 3059 (1986)

[20] Ohring M, "The Materials Science of Thin Films" , Academic Press, 235 (1992).