A high-temperature Auger electron spectroscopy setup and its in situ application to sessile drop experiments of molten silicon on oxide substrates are presented. The experimental setup allows for measurements of previously inaccessible surface reactions at temperatures up to 1700 K. Auger electron spectra of SiO2, MgO, and liquid Si are presented. Furthermore, the areas of the substrates that have been transiently wetted by the silicon melt are investigated. The results are discussed with respect to questions concerning reactive wetting of oxides by metal melts, which are important for the material science of joining processes.