This paper reports a new method for fabricating two-dimensional ZnO nanorod patterns. A water soluble mixture of poly(vinyl alcohol)-N-methyl-4(4'formylstyryl) pyridinium methosulfate acetal (PVA-Sbq) and zinc acetate (ZnA) was used as a negative photoresist to produce the desired patterns using conventional photolithography. Hydrothermally-grown ZnO nanorods were grown selectively on the calcined PVA-Sbq/ZnA patterns. The appropriate concentration of PVA-Sbq and ZnA that can produce the desirable seed layer pattern was determined experimentally. Furthermore, the effects of the calcination time on the morphology and vertical alignment of ZnO nanorods were investigated. The vertically-aligned ZnO nanorods were generated by sufficient calcination of the patterned seed layer. On the other hand, the aspect ratio of ZnO nanorods decreased slightly with increasing calcination time. This new approach provides a simple and cost-effective method for fabricating ZnO nanorod patterns which can be beneficial in various solid-state devices and optoelectronic applications. (C) 2015 Elsevier B.V. All rights reserved.