A method for the removal of alkylamine groups and patterning of alkylamine monolayer on carbon surfaces is proposed. Deep UV light irradiation (172 nm) was used to remove alkylamine monolayers from carbon surfaces. When a photomask was employed, patterned alkylamine monolayers were obtained. Labeling of COOH- and NH2-terminated alkylamine monolayers on carbon surfaces with redox probes and fluorescent dyes, respectively, via amide coupling clearly indicated that deep UV light patterning was successfully achieved.