Directed Growth of Electroactive Metal-Organic Framework Thin Films Using Electrophoretic Deposition

Hod I; Bury W; Karlin DM; Deria P; Kung CW; Katz MJ; So M; Klahr B; Jin DN; Chung YW; Odom TW; Farha OK; Hupp JT

Advanced Materials, Vol.26, No.36, 6295-6300, 2014

DOI10.1002/adma.201401940 Export Citation

Directed Growth of Electroactive Metal-Organic Framework Thin Films Using Electrophoretic Deposition

Hod I, Bury W, Karlin DM, Deria P, Kung CW, Katz MJ, So M, Klahr B, Jin DN, Chung YW, Odom TW, Farha OK, Hupp JT

Electrophoretic deposition (EPD) is used to assemble metal-organic framework (MOF) materials in nano-and micro-particulate, thin-film form. The flexibility of the method is demonstrated by the successful deposition of 4 types of MOFs: NU-1000, UiO-66, HKUST-1, and Al-MIL-53. Additionally, EPD is used to pattern the growth of NU-1000 thin films that exhibit full electrochemical activity.

Keywords:metal organic frameworks;electrophoretic deposition;thin films;electrochemical