- Previous Article
- Next Article
- Table of Contents
Korean Journal of Materials Research, Vol.12, No.11, 835-839, November, 2002
졸-겔법으로 Pt/Ti/SiO 2 /Si 기판위에 제작된 (Bi,La)Ti 3 O 12 강유전체 박막의 특성 연구
Charaterization of (Bi,La)Ti 3 O 12 Ferroelectric Thin Films on Pt/Ti/SiO 2 /Si Substrates by sol-gel Method
E-mail:
Metal-Ferroelectric-Metal(MFM) capacitors were prepared using Bi 3.3 La 0.7 Ti 3 O 12 (BLT) ferroelectric thin films which were spin coated on Pt/Ti/SiO 2 /Si substrates by the Sol-Gel method. BLT thin films annealed at above 650 ? C showed polycrystalline structures with typical c-axis preferred orientation. The grain size and surface roughness were increased as the annealing temperature increased from 650 ? C to 700 ? C . In addition, the full width at half maximum (FWHM) values were decreased with increasing annealing temperatures, indicating the improvement of crystallinity. The remanent polarization (2Pr= Pr + +Pr ?) and leakage current of the BLT film annealed at 650 ? C were about 29.3 μ C/cm 2 and 2.3 \times10 ?8 A/cm 2 at 3V. There were no distinct changes in the retention charges after 10 10 polarization switching cycles, showing good fatigue property of the annealed BLT films.
- Tuttle BA, Mater. Res. Bull., 12, 40 (1987)
- Scott JF, Paz-de Araujo CA, Science, 246, 1400 (1989)
- Auciello O, Ramesh R, MRS Bull., 21, 31 (1996)
- Melnick BM, Gregory J, paz-de Araujo CA, Inter. Ferroelectric, 11, 145 (1995)
- Nakamura T, Nakao Y, Kamisawa A, Takasu H, Ferroelectrics, 11, 161 (1995)
- Park BH, Kang BS, Bu SD, Noh TW, Lee J, Jo W, Nature, 401, 682 (1999)
- Nakamura T, Nakao Y, Kamisawa A, Takasu H, Jpn. J. Appl. Phys., 33, 5207 (1994)
- Choi T, Kim Y, Lee J, J. Korean Phys. Soc., 40, 188 (2002)
- Paz de Araujo CA, Cuchiaro JD, McMillan LD, Scott MC, Nature, 374, 627 (1995)
- Chu PY, Jones RE, Jr, Zurcher P, Taylor DJ, Jiang B, Cillespie SJ, J. Mater. Res., 11, 1065 (1996)
- Aoki M, Mushiga M, Itoh A, Eshita T, Arimoto Y, 1999 Sympo. VLSI Technol. Digest of Tech. Papers (Kyoto, june), 145, (1999) (1999)
- Takashi M, Hiroyuki Y, Hitoshi W, Paz de Araujo CA, Jpn. J. Appl. Phys., 34, 5233 (1998)
- Okamoto K, Tokumitsu E, Appl. Phys. Lett., 76, 2609 (2000)
- Hwang SH, Chang HJ, J. Korean Phys. Soc., 41, 139 (2002)