화학공학소재연구정보센터
홈 로그인 로그아웃 연락처 사이트맵
Korean Journal of Materials Research, Vol.13, No.5, 328-332, May, 2003
DOI10.3740/MRSK.2003.13.5.328  Export Citation
화학기상응축 공정에서 TiO 2 나노입자 특성에 미치는 반응온도와 전구체 농도의 영향 -Part II 분말형성에 대한 반응인자적 분석
Effects of Temperature and Precursor-concentration on Characteristics of TiO 2 Nanoparticles in Chemical Vapor Condensation Process -Part II: Analysis of Particle Formation Estimated by Reaction Factors
이창우, 유지훈, 임성순, 윤성희, 이재성†, 좌용호1
  • 한양대학교 재료화학공학부
  • 1한양대학교 생산공학과
Chang-Woo Lee, Ji-Hun Yu, Sung-Soon Im, Sung-Hee Yun, Jai-Sung Lee†, and Yong-Ho Choa1
  • Department of Metallurgy and Materials Science, Hanyang University, Ansan, 426-791 Korea
  • 1Department of New-Materials Technology, Hanyang University, Ansan, 426-791 Korea
E-mail:
Characteristics of TiO 2 nanoparticles controlled by precursor flow rate and reaction temperature in chemical vapor condensation process were interpreted in the view of decisive reaction factors, i.e. supersaturation ratio, concentration of vapor molecule, collision frequency and rate, and residence time, which directly affect the particle size and size distribution in CVC reactor. As results, the increases of precursor flow rate and reaction temperature induced the increase in the average sizes of TiO 2 nanoparticles in CVC reactor by acceleration of coagulation growth due to the increase of collision between TiO 2 vapor molecules and particles. The effects of reaction factors on the characteristics of TiO 2 nanoparticles were discussed with considering particle formation process in CVC reactor under given process parameters.
Keywords:CVC process;supersaturation ratio;concentration;collision frequency and rate;residence time
  1. Chang W, Skandan G, Hahn H, Danforth SC, Kear BH, Nanostruct. Mater., 4(3), 345 (1994)
  2. Chang W, Skandan G, Danforth SC, Kear BH, Hahn H, Nanostruct. Mater., 4(5), 507 (1994)
  3. Kear BH, Strutt PR, Nanostruct. Mater., 6(1-2), 227 (1995)
  4. Axelbaum RL, DuFaux DP, Frey CA, J. Mater. Res., 11(4), 948 (1996)
  5. Yu JH, Lee JS, Ahn KH, Scripta Materilia, 44(8-9), 2213 (2001)
  6. Lee CW, Yu JH, Im SS, Yun SH, Lee JS, Choa YH, Korean J. Mater. Res., 13(5), 323 (2003)
  7. Friedlander SK, Smoke, Dust, and Haze-Fundamentals of Aerosol Dynamics, 2nd ed., p.251, Oxford, U.P., Oxford, New York (2000) (2000)
  8. Samsonov GV, The Oxide Handbook, 2nd ed., p.149, IFI/Plenum Publishing Co. New York (1982) (1982)
  9. Hinds WC, Aerosol Technology, 2nd ed., p.254, John Wiley and Sons Inc., New York, (1982) (1982)
  10. Sivaram S, Chemical Vapor Deposition, p. 14, Van Nostrand Reihold International Thompson Publishing Inc., New York (1995) (1995)
  11. Ulrich GD, Combust. Sci. Technol., 4, 47 (1971)
  12. Ulrich GD, Riehl JW, J. Colloid Interface Sci., 87(1), 257 (1982)
  13. Xiong Y, Pratsinis SE, J. Aerosol Sci., 22, 637 (1991)
  14. Mori I, Nishikawa M, Iwasaka Y, The Sci. of the Total Environment, 224, 87 (1998)
  15. Smoluchowski M, Bull. Acad. Sci., Cracow, 1a, 28 (1911) (1911)