Korean Journal of Materials Research, Vol.14, No.11, 780-785, November, 2004
접합유리와 반응된 Fe-Hf-N/Cr/SiO 2 박막의 연자기 특성 열화
Degradation of Soft Magnetic Properties of Fe-Hf-N/Cr/SiO 2 Thin Films Reacted with Bonding Glass
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The degradation mechanism of soft magnetic properties of Fe?Hf?N/Cr/SiO 2 thin films reacted with a bonding glass was investigated. When Fe?Hf?N/Cr/SiO 2 films were annealed under 600 ? C without the bonding glass, the compositions and the soft magnetic properties of Fe-Hf-N layers were not changed. However, after reaction with the bonding glass at 550 ? C , the soft magnetic properties of the film were degraded. At 600 ? C , the saturation magnetization of the reacted film decreased to 13.5 kG, and its coercivity increased to 4 Oe, and its effective permeability decreased to 700. It was founded that O diffused from the glass into the Fe-Hf-N layers during the reaction and generated HfO 2 phases. It was considered that the soft magnetic properties of the Fe?Hf?N/Cr/SiO 2 films reacted with the bonding glass were primarily degraded by the formation of the Fe-Hf-O-N layer of which the Fe content was below 60 at% , and secondarily degraded by the Fe-Hf-O-N layer above 70 at% .
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